Gas Pụrụ Iche
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Sọlfọ Tetrafluoride (SF4)
Nọmba EINECS: 232-013-4
Nọmba CAS: 7783-60-0 -
Nitrous Oxide (N2O)
Nitrous oxide, nke a makwaara dị ka gas na-achị ọchị, bụ kemịkalụ dị ize ndụ nke nwere usoro kemịkalụ N2O. Ọ bụ gas na-enweghị agba, nke na-esi ísì ụtọ. N2O bụ oxidant nke nwere ike ịkwado ọkụ n'ọnọdụ ụfọdụ, mana ọ na-adịgide adịgide na okpomọkụ ụlọ ma nwee obere mmetụta anestetiiki. , ma nwee ike ime ka ndị mmadụ chịa ọchị. -
Kabọn Tetrafluoride (CF4)
Carbon tetrafluoride, nke a makwaara dị ka tetrafluoromethane, bụ gas na-enweghị agba na okpomọkụ na nrụgide nkịtị, nke na-anaghị agbaze na mmiri. CF4 gas bụ gas a na-eji eme ihe n'ọtụtụ ebe na ụlọ ọrụ microelectronics. A na-ejikwa ya dị ka gas laser, refrigerant cryogenic, ihe mgbaze, mmanụ, ihe mkpuchi, na ihe na-eme ka mmiri dị jụụ maka tubes nchọpụta infrared. -
Sulfuryl Fluoride (F2O2S)
A na-ejikarị Sulfuryl fluoride SO2F2, gas na-egbu egbu, eme ihe dị ka ọgwụ ahụhụ. Ebe ọ bụ na sulfuryl fluoride nwere njirimara nke mgbasa siri ike na ikike mmadụ nwere ike ime ihe, ọgwụ ahụhụ sara mbara, obere dose, obere ihe fọdụrụ, ọsọ ngwa ngwa igbu ụmụ ahụhụ, obere oge mgbasa gas, ojiji dị mma na obere okpomọkụ, enweghị mmetụta na ọnụego mkpụrụ na obere nsí, ka a na-ejikarị ya eme ihe n'ụlọ nkwakọba ihe, ụgbọ mmiri ibu, ụlọ, dam mmiri, mgbochi termite, wdg. -
Silane (SiH4)
Silane SiH4 bụ gas a na-akpọ "insect gas" nke na-enweghị agba, na-egbu egbu, ma na-arụ ọrụ nke ọma n'oge okpomọkụ na nrụgide nkịtị. A na-eji Silane eme ihe nke ukwuu n'ọganihu epitaxial nke silicon, ihe eji emepụta polysilicon, silicon oxide, silicon nitride, wdg, mkpụrụ ndụ anyanwụ, eriri anya, imepụta iko agba, na itinye uzuoku kemịkalụ. -
Octafluorocyclobutane (C4F8)
Octafluorocyclobutane C4F8, ịdị ọcha nke gas: 99.999%, a na-ejikarị ya eme ihe dị ka ihe na-akpalite ihe oriri na gas dị n'etiti. A na-ejikarị ya eme ihe na usoro PECVD (Plasma Enhance. Chemical Vapor deposition), a na-eji C4F8 eme ihe dị ka ihe nnọchi anya CF4 ma ọ bụ C2F6, nke a na-eji dị ka gas nhicha na gas semiconductor etching process. -
Nitric Oxide (NO)
Gas Nitric oxide bụ ngwakọta nke nitrogen nwere usoro kemịkalụ NO. Ọ bụ gas na-enweghị agba, enweghị isi, na-egbu egbu nke na-anaghị agbaze na mmiri. Nitric oxide na-emeghachi omume nke ukwuu ma na-emeghachi omume na oxygen iji mepụta gas nitrogen dioxide (NO₂). -
Haịdrojiin Chloride (HCl)
Hydrogen chloride HCL Gas bụ gas na-enweghị agba nke nwere isi na-esi ísì ụtọ. A na-akpọ mmiri mmiri ya hydrochloric acid, nke a makwaara dị ka hydrochloric acid. A na-ejikarị hydrogen chloride eme agba, ihe na-esi ísì ụtọ, ọgwụ, ọtụtụ chlorides na ihe mgbochi nchara. -
Hexafluoropropylene (C3F6)
Hexafluoropropylene, usoro kemịkalụ: C3F6, bụ gas na-enweghị agba n'ọnọdụ okpomọkụ na nrụgide nkịtị. A na-ejikarị ya eme ihe maka ịkwadebe ngwaahịa kemịkalụ dị iche iche nwere fluorine, ihe ndị na-eme ka ọgwụ dị n'ime ya, ihe ndị na-eme ka ọkụ gbanyụọ, wdg, a pụkwara iji ya kwadebe ihe polymer nwere fluorine. -
Amonia (NH3)
Mmiri ammonia/mmiri ammonia nke na-anaghị agbaze agbaze bụ ihe dị mkpa maka kemịkalụ, nke nwere ọtụtụ ihe dị iche iche. Enwere ike iji mmiri ammonia mee ihe dị ka ihe na-eme ka ọ dị jụụ. A na-ejikarị ya emepụta nitric acid, urea na fatịlaịza kemịkalụ ndị ọzọ, a pụkwara iji ya mee ihe dị ka ihe eji eme ọgwụ na ọgwụ ahụhụ. N'ime ụlọ ọrụ nchekwa, a na-eji ya emepụta ihe na-eme ka rọketi na ngwa agha dị iche iche.
