Gases pụrụ iche

  • Sulfur tetrafluoride (SF4)

    Sulfur tetrafluoride (SF4)

    EINECS NO: 232-013-4
    CAS NO: 7783-60-0
  • Nitrous oxide (N2O)

    Nitrous oxide (N2O)

    Nitrous oxide, nke a makwaara dị ka gas na-achị ọchị, bụ kemịkalụ dị ize ndụ nke nwere usoro kemịkal N2O. Ọ bụ gas na-esi ísì ụtọ na-enweghị agba. N2O bụ oxidant nke nwere ike ịkwado combustion n'okpuru ọnọdụ ụfọdụ, mana ọ kwụsiri ike na ụlọ okpomọkụ ma nwee ntakịrị mmetụta anestetiiki. , ma nwee ike ime ka ndị mmadụ chịa ọchị.
  • Carbon tetrafluoride (CF4)

    Carbon tetrafluoride (CF4)

    Carbon tetrafluoride, nke a makwaara dị ka tetrafluoromethane, bụ gas na-enweghị ụcha na ọnọdụ okpomọkụ na nrụgide nkịtị, nke na-adịghị edozi na mmiri. gas CF4 bụ ugbu a bụ gas etching plasma kachasị eji na ụlọ ọrụ microelectronics. A na-ejikwa ya dị ka gas laser, refrigerant cryogenic, ihe mgbaze, mmanu, ihe mkpuchi, na coolant maka tubes nchọpụta infrared.
  • Sulfuryl fluoride (F2O2S)

    Sulfuryl fluoride (F2O2S)

    Sulfuryl fluoride SO2F2, gas na-egbu egbu, bụ nke a na-ejikarị dị ka ọgwụ ahụhụ. N'ihi na sulfuryl fluoride nwere njiri mara nke mgbasa siri ike na permeability, nnukwu ụdị ụmụ ahụhụ, obere usoro onunu ogwu, obere ihe fọdụrụnụ, ọsọ ụmụ ahụhụ ngwa ngwa, obere oge mgbasa gas, iji dị mma na obere okpomọkụ, enweghị mmetụta na ọnụego germination na obere toxicity, nke ka ukwuu. A na-ejikarị ya eme ihe n'ụlọ nkwakọba ihe, ụgbọ mmiri ibu, ụlọ, mmiri mmiri mmiri, mgbochi ọnwụ, wdg.
  • Silane (SiH4)

    Silane (SiH4)

    Silane SiH4 bụ gas na-enweghị agba, na-egbu egbu ma na-arụsi ọrụ ike na okpomọkụ na nrụgide nkịtị. A na-eji Silane eme ihe n'ọtụtụ ebe na uto epitaxial nke silicon, akụrụngwa maka polysilicon, silicon oxide, silicon nitride, wdg, sel anyanwụ, eriri anya, imepụta iko agba agba, na ntinye kemịkalụ.
  • Octafluorocyclobutane (C4F8)

    Octafluorocyclobutane (C4F8)

    Octafluorocyclobutane C4F8, gas dị ọcha: 99.999%, nke a na-ejikarị dị ka nri aerosol propellant na ọkara gas. A na-ejikarị ya eme ihe na semiconductor PECVD (Plasma Enhance. Chemical Vapor deposition), C4F8 na-eji dochie anya CF4 ma ọ bụ C2F6, na-eji dị ka ihicha gas na semiconductor usoro etching gas.
  • Nitric oxide (Mba)

    Nitric oxide (Mba)

    Nitric oxide gas bụ ngwakọta nke nitrogen nwere usoro kemịkalụ NO. Ọ bụ gas na-enweghị isi, enweghị isi, nke na-egbu egbu nke na-esighi ike na mmiri. Nitric oxide na-emeghachi omume n'ụzọ dị ukwuu ma na-emeghachi omume na oxygen iji mepụta gas nitrogen dioxide na-emebi emebi (NO₂).
  • Hydrogen chloride (HCl)

    Hydrogen chloride (HCl)

    Hydrogen chloride HCL Gas bụ gas na-enweghị ụcha nke na-esi ísì ụtọ. A na-akpọ ngwọta mmiri ya hydrochloric acid, nke a makwaara dị ka hydrochloric acid. A na-ejikarị hydrogen chloride eme ihe eji esiji esiji, ngwa nri, ọgwụ, chloride dị iche iche na ihe mgbochi corrosion.
  • Hexafluoropropylene (C3F6)

    Hexafluoropropylene (C3F6)

    Hexafluoropropylene, usoro kemịkalụ: C3F6, bụ gas na-enweghị agba na okpomọkụ na nrụgide nkịtị. A na-ejikarị ya akwadebe ngwaahịa kemịkal dị mma nke nwere fluorine, ndị na-ahụ maka ọgwụ, ndị na-emenyụ ọkụ, wdg, a pụkwara iji ya kwadebe ihe polymer nwere fluorine.
  • Amonia (NH3)

    Amonia (NH3)

    Liquid amonia / anhydrous amonia bụ ihe dị mkpa kemịkalụ akụrụngwa nwere ọtụtụ ngwa. Enwere ike iji amonia mmiri mee ihe dị ka friji. A na-ejikarị emepụta nitric acid, urea na fatịlaịza kemịkalụ ndị ọzọ, a pụkwara iji ya mee ihe dị ka akụrụngwa maka ọgwụ na pesticides. N'ime ụlọ ọrụ nchekwa, a na-eji ya eme ihe na-emepụta ihe maka rọketi na ngwa agha.