Gases pụrụ iche
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Sulfur tetrafluoride (SF4)
EINECS NO: 232-013-4
CAS NO: 7783-60-0 -
Nitrous oxide (N2O)
Nitrous oxide, nke a makwaara dị ka gas na-achị ọchị, bụ kemịkalụ dị ize ndụ nwere usoro kemịkal N2O. Ọ bụ gas na-esi ísì ụtọ na-enweghị agba. N2O bụ oxidant nke nwere ike ịkwado combustion n'okpuru ọnọdụ ụfọdụ, mana ọ kwụsiri ike na ụlọ okpomọkụ ma nwee ntakịrị mmetụta anestetiiki. , ma nwee ike ime ka ndị mmadụ chịa ọchị. -
Carbon tetrafluoride (CF4)
Carbon tetrafluoride, nke a makwaara dị ka tetrafluoromethane, bụ gas na-enweghị ụcha na ọnọdụ okpomọkụ na nrụgide nkịtị, nke na-esighi ike na mmiri. gas CF4 bụ ugbu a bụ gas etching plasma kachasị eji na ụlọ ọrụ microelectronics. A na-ejikwa ya dị ka gas laser, refrigerant cryogenic, ihe mgbaze, mmanu, ihe mkpuchi, na coolant maka tubes nchọpụta infrared. -
Sulfuryl fluoride (F2O2S)
Sulfuryl fluoride SO2F2, gas na-egbu egbu, bụ nke a na-ejikarị dị ka ọgwụ ahụhụ. N'ihi na sulfuryl fluoride nwere àgwà nke ike mgbasa na permeability, sara mbara-ụdịdị iche iche ụmụ ahụhụ, obere onunu ogwu, obere ihe fọdụrụnụ ego, ngwa ngwa ụmụ ahụhụ ọsọ, obere gas dispersion oge, adaba ojiji na obere okpomọkụ, ọ dịghị mmetụta na germination ọnụego na ala toxicity, na ihe Ọ na-na-na-na-na ọtụtụ-eji na-egbochi ụlọ nkwakọba, ibu ụgbọ mmiri okwu, ụlọ, wdg. -
Silane (SiH4)
Silane SiH4 bụ gas na-enweghị agba, na-egbu egbu ma na-arụsi ọrụ ike na okpomọkụ na nrụgide nkịtị. A na-eji Silane eme ihe n'ọtụtụ ebe na uto epitaxial nke silicon, akụrụngwa maka polysilicon, silicon oxide, silicon nitride, wdg, sel anyanwụ, eriri anya, imepụta iko agba agba, na ntinye kemịkalụ. -
Octafluorocyclobutane (C4F8)
Octafluorocyclobutane C4F8, gas dị ọcha: 99.999%, nke a na-ejikarị dị ka nri aerosol propellant na ọkara gas. A na-ejikarị ya eme ihe na semiconductor PECVD (Plasma Enhance. Chemical Vapor deposition), C4F8 na-eji dochie anya CF4 ma ọ bụ C2F6, na-eji dị ka ihicha gas na semiconductor usoro etching gas. -
Nitric oxide (Mba)
Nitric oxide gas bụ ngwakọta nke nitrogen nwere usoro kemịkalụ NO. Ọ bụ gas na-enweghị isi, enweghị isi, nke na-egbu egbu nke na-esighi ike na mmiri. Nitric oxide na-emeghachi omume nke ukwuu n'ụzọ kemịkalụ ma jiri oxygen na-emeghachi omume iji mepụta gas nitrogen dioxide na-emebi emebi (NO₂). -
Hydrogen chloride (HCl)
Hydrogen chloride HCL Gas bụ gas na-enweghị ụcha nke na-esi ísì ụtọ. A na-akpọ ngwọta mmiri ya hydrochloric acid, nke a makwaara dị ka hydrochloric acid. A na-ejikarị hydrogen chloride eme ihe eji esiji esiji, ngwa nri, ọgwụ, chloride dị iche iche na ihe mgbochi corrosion. -
Hexafluoropropylene (C3F6)
Hexafluoropropylene, usoro kemịkalụ: C3F6, bụ gas na-enweghị agba na okpomọkụ na nrụgide nkịtị. A na-ejikarị ya akwadebe ngwaahịa kemịkal dị mma nke nwere fluorine, ndị na-ahụ maka ọgwụ, ndị na-emenyụ ọkụ, wdg, a pụkwara iji ya kwadebe ihe polymer nwere fluorine. -
Amonia (NH3)
Liquid amonia / anhydrous amonia bụ ihe dị mkpa kemịkalụ akụrụngwa nwere ọtụtụ ngwa. Enwere ike iji amonia mmiri mee ihe dị ka friji. A na-ejikarị emepụta nitric acid, urea na fatịlaịza kemịkalụ ndị ọzọ, a pụkwara iji ya mee ihe dị ka akụrụngwa maka ọgwụ na pesticides. N'ime ụlọ ọrụ nchekwa, a na-eji ya eme ihe na-emepụta ihe maka rọketi na ngwa agha.
