Ngwaahịa
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Oxygen (O2)
Oxygen bụ gas na-enweghị agba na isi. Ọ bụ ụdị oxygen kachasị ewu ewu. Banyere teknụzụ, a na-ewepụta oxygen site na usoro ikuku liquefaction, oxygen dị n'ikuku na-abụkwa ihe dị ka 21%. Oxygen bụ gas na-enweghị agba na isi na-enweghị ya nke nwere usoro kemịkalụ O2, nke bụ ụdị oxygen kachasị ewu ewu. Ebe agbaze bụ -218.4°C, ebe esi mmiri bụ -183°C. Ọ naghị agbaze ngwa ngwa na mmiri. Ihe dị ka 30mL nke oxygen na-agbaze na 1L nke mmiri, oxygen mmiri ahụ na-acha anụnụ anụnụ. -
Sọlfọ Dioksịd (SO2)
Sulfur dioxide (sulfur dioxide) bụ sọlfọ oxide kachasị, nke kachasị mfe, ma na-akpasu iwe site na usoro kemịkalụ SO2. Sulfur dioxide bụ gas na-enweghị agba na nke doro anya nke nwere isi na-esi ísì ọjọọ. Mmiri sulfur dioxide dị na mmiri, ethanol na ether, anaghị agbaze, ọ naghị arụ ọrụ, ọ naghịkwa ere ọkụ, ọ naghịkwa emepụta ngwakọta mgbawa na ikuku. Sulfur dioxide nwere ihe ndị na-eme ka ọbara dị ọcha. A na-ejikarị sulfur dioxide eme ihe n'ụlọ ọrụ mmepụta ihe iji mee ka pulp, ajị anụ, silk, okpu ahịhịa, wdg dị ọcha. Sulfur dioxide nwekwara ike igbochi uto nke ebu na nje bacteria. -
Ethylene Oxide (ETO)
Ethylene oxide bụ otu n'ime ihe ndị na-eme ka ọ dị mfe. Ọ bụ ihe na-eme ka ọ dị ka heterocyclic. Usoro kemịkalụ ya bụ C2H4O. Ọ bụ ihe na-akpata kansa na-egbu egbu na ngwaahịa petrochemical dị mkpa. Njirimara kemịkalụ nke ethylene oxide na-arụ ọrụ nke ukwuu. Ọ nwere ike ịnweta mmeghachi omume mgbakwunye na-emepe mgbanaka na ọtụtụ ihe mejupụtara ma nwee ike ibelata nitrate ọlaọcha. -
1,3 Butadiene (C4H6)
1,3-Butadiene bụ ihe mejupụtara organic nwere usoro kemịkalụ nke C4H6. Ọ bụ gas na-enweghị agba nwere obere isi ísì ụtọ ma dị mfe ịgbaze. Ọ naghị egbu egbu nke ukwuu, nsị ya yiri nke ethylene, mana ọ na-akpasu akpụkpọ ahụ na akpụkpọ ahụ mucous ike, ma na-enwe mmetụta anestetiiki mgbe enwere oke njupụta. -
Haịdrojiin (H2)
Haịdrojiin nwere usoro kemịkalụ nke H2 na ịdị arọ nke molekul nke 2.01588. N'okpuru okpomọkụ na nrụgide nkịtị, ọ bụ gas na-ere ọkụ nke ukwuu, enweghị agba, doro anya, enweghị isi na ụtọ nke siri ike ịgbaze na mmiri, ọ naghịkwa emeghachi omume na ọtụtụ ihe. -
Neon (Ne)
Neon bụ gas dị ụkọ nke na-enweghị agba, na-enweghị isi, na-anaghị ere ọkụ nke nwere usoro kemịkalụ nke Ne. Ọtụtụ mgbe, enwere ike iji neon dị ka gas na-ejuputa maka ọkụ neon agba maka ngosipụta mgbasa ozi n'èzí, enwere ike iji ya maka ihe ngosi ìhè anya na nhazi voltaji. Na ihe mejupụtara ngwakọta gas laser. Enwere ike iji gas ndị dị ka Neon, Krypton na Xenon jupụta ngwaahịa iko iji melite arụmọrụ ma ọ bụ ọrụ ha. -
Kabọn Tetrafluoride (CF4)
Carbon tetrafluoride, nke a makwaara dị ka tetrafluoromethane, bụ gas na-enweghị agba na okpomọkụ na nrụgide nkịtị, nke na-anaghị agbaze na mmiri. CF4 gas bụ gas a na-eji eme ihe n'ọtụtụ ebe na ụlọ ọrụ microelectronics. A na-ejikwa ya dị ka gas laser, refrigerant cryogenic, ihe mgbaze, mmanụ, ihe mkpuchi, na ihe na-eme ka mmiri dị jụụ maka tubes nchọpụta infrared. -
Sulfuryl Fluoride (F2O2S)
A na-ejikarị Sulfuryl fluoride SO2F2, gas na-egbu egbu, eme ihe dị ka ọgwụ ahụhụ. Ebe ọ bụ na sulfuryl fluoride nwere njirimara nke mgbasa siri ike na ikike mmadụ nwere ike ime ihe, ọgwụ ahụhụ sara mbara, obere dose, obere ihe fọdụrụ, ọsọ ngwa ngwa igbu ụmụ ahụhụ, obere oge mgbasa gas, ojiji dị mma na obere okpomọkụ, enweghị mmetụta na ọnụego mkpụrụ na obere nsí, ka a na-ejikarị ya eme ihe n'ụlọ nkwakọba ihe, ụgbọ mmiri ibu, ụlọ, dam mmiri, mgbochi termite, wdg. -
Silane (SiH4)
Silane SiH4 bụ gas a na-akpọ "insect gas" nke na-enweghị agba, na-egbu egbu, ma na-arụ ọrụ nke ọma n'oge okpomọkụ na nrụgide nkịtị. A na-eji Silane eme ihe nke ukwuu n'ọganihu epitaxial nke silicon, ihe eji emepụta polysilicon, silicon oxide, silicon nitride, wdg, mkpụrụ ndụ anyanwụ, eriri anya, imepụta iko agba, na itinye uzuoku kemịkalụ. -
Octafluorocyclobutane (C4F8)
Octafluorocyclobutane C4F8, ịdị ọcha nke gas: 99.999%, a na-ejikarị ya eme ihe dị ka ihe na-akpalite ihe oriri na gas dị n'etiti. A na-ejikarị ya eme ihe na usoro PECVD (Plasma Enhance. Chemical Vapor deposition), a na-eji C4F8 eme ihe dị ka ihe nnọchi anya CF4 ma ọ bụ C2F6, nke a na-eji dị ka gas nhicha na gas semiconductor etching process. -
Nitric Oxide (NO)
Gas Nitric oxide bụ ngwakọta nke nitrogen nwere usoro kemịkalụ NO. Ọ bụ gas na-enweghị agba, enweghị isi, na-egbu egbu nke na-anaghị agbaze na mmiri. Nitric oxide na-emeghachi omume nke ukwuu ma na-emeghachi omume na oxygen iji mepụta gas nitrogen dioxide (NO₂). -
Haịdrojiin Chloride (HCl)
Hydrogen chloride HCL Gas bụ gas na-enweghị agba nke nwere isi na-esi ísì ụtọ. A na-akpọ mmiri mmiri ya hydrochloric acid, nke a makwaara dị ka hydrochloric acid. A na-ejikarị hydrogen chloride eme agba, ihe na-esi ísì ụtọ, ọgwụ, ọtụtụ chlorides na ihe mgbochi nchara.
