Ngwaahịa

  • Oxygen (O2)

    Oxygen (O2)

    Oxygen bụ gas na-enweghị isi na enweghị isi. Ọ bụ ụdị mbụ nke oxygen. N'ihe gbasara nkà na ụzụ, a na-ewepụta oxygen site na usoro mmiri mmiri ikuku, na ikuku oxygen dị n'ime ikuku bụ ihe dịka 21%. Oxygen bụ gas na-enweghị agba na enweghị isi nke nwere usoro kemịkalụ O2, nke bụ ụdị ikuku oxygen na-ahụkarị. Ebe na-agbaze bụ -218.4 Celsius C, ebe isi bụ -183 Celsius. Ọ naghị adị mfe mgbaze na mmiri. Ihe dị ka 30ml nke oxygen na-agbaze na 1l mmiri, na mmiri mmiri oxygen na-acha anụnụ anụnụ.
  • Sulfur dioxide (SO2)

    Sulfur dioxide (SO2)

    Sulfur dioxide (sulfur dioxide) bụ sọlfọ oxide nke a na-ahụkarị, dị mfe na nke na-akpasu iwe nwere usoro kemịkalụ SO2. Sulfur dioxide bụ gas na-enweghị ụcha na nke nwere isi na-esi ísì ụtọ. Na-agbaze n'ime mmiri, ethanol na ether, sọlfọ sulfur dioxide na-adịtụ mma, adịghị arụ ọrụ, enweghị ọkụ, ọ dịghịkwa emepụta ngwakọta mgbawa na ikuku. Sulfur dioxide nwere mmetụta ịcha ọcha. A na-ejikarị sọlfọ dioxide eme ihe na ụlọ ọrụ iji ihicha pulp, ajị anụ, silk, okpu ahịhịa, wdg. Sulfur dioxide nwekwara ike igbochi uto nke ebu na nje bacteria.
  • Ethylene oxide (ETO)

    Ethylene oxide (ETO)

    Ethylene oxide bụ otu n'ime ether cyclic kacha dị mfe. Ọ bụ ogige heterocyclic. Usoro ọgwụ ya bụ C2H4O. Ọ bụ carcinogen na-egbu egbu na ngwaahịa petrochemical dị mkpa. Njirimara kemịkalụ nke ethylene oxide na-arụ ọrụ nke ukwuu. Ọ nwere ike nweta mmeghachi omume mgbakwunye mgbanaka na ọtụtụ ogige ma nwee ike ibelata nitrate ọlaọcha.
  • 1,3 Butadiene (C4H6)

    1,3 Butadiene (C4H6)

    1,3-Butadiene bụ ngwakọta organic nke nwere usoro kemịkalụ nke C4H6. Ọ bụ gas na-enweghị ụcha nke nwere ntakịrị ísì ísì ma dị mfe ịgbanye. Ọ dị ntakịrị ihe na-egbu egbu na nsị ya yiri nke ethylene, ma ọ nwere mgbakasị ahụ siri ike na akpụkpọ ahụ na akpụkpọ anụ mucous, ma nwee mmetụta anestetiiki na nnukwu mkpokọta.
  • Hydrogen (H2)

    Hydrogen (H2)

    Hydrogen nwere usoro kemịkalụ H2 na ịdị arọ molekụla nke 2.01588. N'okpuru ọnọdụ okpomọkụ na nrụgide nkịtị, ọ bụ ihe na-ere ọkụ nke ukwuu, nke na-enweghị ụcha, nke na-egbuke egbuke, na-esi ísì ụtọ na nke na-enweghị ụtọ nke na-esi ike igbari na mmiri, ọ dịghịkwa emeghachi omume na ọtụtụ ihe.
  • Neon (Ne)

    Neon (Ne)

    Neon bụ gas na-adịghị ahụkebe, enweghị isi, enweghị ọkụ nwere usoro kemịkal nke Ne. Ọtụtụ mgbe, enwere ike iji neon dị ka gas na-ejuputa maka ọkụ neon acha maka ngosipụta mgbasa ozi n'èzí, a pụkwara iji ya mee ihe maka ihe ngosi ọkụ anya na ụkpụrụ voltaji. Na laser gas ngwakọta components. A pụkwara iji gas dị mma dị ka Neon, Krypton na Xenon mejupụta ngwaahịa iko iji melite arụmọrụ ma ọ bụ ọrụ ha.
  • Carbon tetrafluoride (CF4)

    Carbon tetrafluoride (CF4)

    Carbon tetrafluoride, nke a makwaara dị ka tetrafluoromethane, bụ gas na-enweghị ụcha na ọnọdụ okpomọkụ na nrụgide nkịtị, nke na-adịghị edozi na mmiri. gas CF4 bụ ugbu a bụ gas etching plasma kachasị eji na ụlọ ọrụ microelectronics. A na-ejikwa ya dị ka gas laser, refrigerant cryogenic, ihe mgbaze, mmanu, ihe mkpuchi, na coolant maka tubes nchọpụta infrared.
  • Sulfuryl fluoride (F2O2S)

    Sulfuryl fluoride (F2O2S)

    Sulfuryl fluoride SO2F2, gas na-egbu egbu, bụ nke a na-ejikarị dị ka ọgwụ ahụhụ. N'ihi na sulfuryl fluoride nwere njiri mara nke mgbasa siri ike na permeability, nnukwu ụdị ụmụ ahụhụ, obere usoro onunu ogwu, obere ihe fọdụrụnụ, ọsọ ụmụ ahụhụ ngwa ngwa, obere oge mgbasa gas, iji dị mma na obere okpomọkụ, enweghị mmetụta na ọnụego germination na obere toxicity, nke ka ukwuu. A na-ejikarị ya eme ihe n'ụlọ nkwakọba ihe, ụgbọ mmiri ibu, ụlọ, mmiri mmiri mmiri, mgbochi ọnwụ, wdg.
  • Silane (SiH4)

    Silane (SiH4)

    Silane SiH4 bụ gas na-enweghị agba, na-egbu egbu ma na-arụsi ọrụ ike na okpomọkụ na nrụgide nkịtị. A na-eji Silane eme ihe n'ọtụtụ ebe na uto epitaxial nke silicon, akụrụngwa maka polysilicon, silicon oxide, silicon nitride, wdg, sel anyanwụ, eriri anya, imepụta iko agba agba, na ntinye kemịkalụ.
  • Octafluorocyclobutane (C4F8)

    Octafluorocyclobutane (C4F8)

    Octafluorocyclobutane C4F8, gas dị ọcha: 99.999%, nke a na-ejikarị dị ka nri aerosol propellant na ọkara gas. A na-ejikarị ya eme ihe na semiconductor PECVD (Plasma Enhance. Chemical Vapor deposition), C4F8 na-eji dochie anya CF4 ma ọ bụ C2F6, na-eji dị ka ihicha gas na semiconductor usoro etching gas.
  • Nitric oxide (Mba)

    Nitric oxide (Mba)

    Nitric oxide gas bụ ngwakọta nke nitrogen nwere usoro kemịkalụ NO. Ọ bụ gas na-enweghị isi, enweghị isi, nke na-egbu egbu nke na-esighi ike na mmiri. Nitric oxide na-emeghachi omume n'ụzọ dị ukwuu ma na-emeghachi omume na oxygen iji mepụta gas nitrogen dioxide na-emebi emebi (NO₂).
  • Hydrogen chloride (HCl)

    Hydrogen chloride (HCl)

    Hydrogen chloride HCL Gas bụ gas na-enweghị ụcha nke na-esi ísì ụtọ. A na-akpọ ngwọta mmiri ya hydrochloric acid, nke a makwaara dị ka hydrochloric acid. A na-ejikarị hydrogen chloride eme ihe eji esiji esiji, ngwa nri, ọgwụ, chloride dị iche iche na ihe mgbochi corrosion.