Teknụzụ akpọnwụ na-acha odo odo bụ otu n'ime usoro. Akọrọ gas etching bụ ihe dị mkpa na semiconductor na-arụpụta ya na isi mmalite gas dị mkpa maka plasma etchma. Ime arụmọrụ ya ozugbo na-emetụta ogo na arụmọrụ nke ngwaahịa ikpeazụ. Edemede a tumade kerịta ihe bụ ihe a na-ejikarị gas gas na-eme.
A na-eme ka ikuku kwụrụ ụgwọ: dị kacarbon tetrafluoride (cf4), hexafluoooahane (c2f6), trifluouromethane (chf3) na perfeoropane (c3f8). A gasses ndị a nwere ike iwepụta fluatigides veratile mgbe etching silicon na silicon ogige, si otú ahụ wee nweta iwepụ ihe onwunwe.
Chlorine dabere na: dị ka chlorine (CL2),boron trichloride (BCL3)na silicon tetrachloride (Sicl4). Chlorine siteres nwere ike inye eonch eons n'oge usoro etching, nke na-enyere aka mee ka ọnụego ya dị mma na nhọrọ.
A na-eme ka ikuku bata: dị ka bromine (br2) na bromine (ibr). A na-eme ikuku nke bromine nwere ike inye ezigbo ọrụ na usoro etching ụfọdụ, ọkachasị mgbe ị na-eme ihe siri ike dịka silicon carbide.
Natrogen na ikuku sitere na oxygen: dị ka nitrogen trifluoride (NF3) na oxygen (O2). A na-ejikarị gas ndị a emezigharị ọnọdụ mmeghachi omume na usoro etchging iji meziwanye nhọrọ na ntụzi nke etching.
Gas ndị a na-eme ka otu ihe a na-esi na-ekikere ihe nke anụ ahụ site na njikọta nke anụ ahụ na kemịkalụ kemịkalụ n'oge plasma etching. Nhọrọ nke a gas na-adabere n'ụdị ihe a ga-eme ma etched, ihe nhọrọ nhọrọ nhọrọ, na ọnụego a chọrọ etching.
Oge Post: Feb-08-2025
