Kedu ihe bụ gas etching nke a na-ejikarị na etching akọrọ?

Teknụzụ etching akọrọ bụ otu n'ime usoro isi. Akọrọ etching gas bụ isi ihe na mmepụta semiconductor na isi iyi gas dị mkpa maka etching plasma. Ọrụ ya na-emetụta àgwà na arụmọrụ nke ngwaahịa ikpeazụ. Edemede a na-akọwakarị ihe bụ gas etching nke a na-ejikarị na usoro etching akọrọ.

Gasị ndị sitere na fluorine: dị kacarbon tetrafluoride (CF4), hexafluoroethane (C2F6), trifluoromethane (CHF3) na perfluoropropane (C3F8). Gasị ndị a nwere ike ịmepụta fluorides na-agbanwe agbanwe mgbe ha na-emepụta silicon na ogige silicon, si otú ahụ na-enweta mwepụ ihe onwunwe.

Gas sitere na chlorine: dị ka chlorine (Cl2),boron trichloride (BCl3)na silicon tetrachloride (SiCl4). Gases nke nwere chlorine nwere ike inye ions chloride n'oge usoro etching, nke na-enyere aka melite ọnụego etching na selectivity.

Gases sitere na bromine: dị ka bromine (Br2) na bromine iodide (IBr). Gasị ndị sitere na Bromine nwere ike inye arụmọrụ kacha mma na usoro etching ụfọdụ, ọkachasị mgbe etching ihe siri ike dị ka silicon carbide.

Nitrogen dabeere na ikuku oxygen: dị ka nitrogen trifluoride (NF3) na oxygen (O2). A na-ejikarị gas ndị a eme ihe iji dozie ọnọdụ mmeghachi omume na usoro etching iji meziwanye nhọrọ na ntụziaka nke etching.

Igwe ikuku ndị a na-enweta nke ọma etching nke elu ihe site na ngwakọta nke nsị anụ ahụ na mmeghachi omume kemịkal n'oge etching plasma. Nhọrọ nke etching gas na-adabere n'ụdị ihe a ga-etinye, nhọrọ nhọrọ nke etching, na ọnụ ọgụgụ etching chọrọ.