Ọrụ nke sọlfọ hexafluoride na silicon nitride etching

Sulfur hexafluoride bụ gas nke nwere ihe mkpuchi dị mma ma na-ejikarị emenyụ ọkụ eletrik dị elu na-ekpochapụ na ndị na-agbanwe agbanwe, eriri nnyefe voltaji, ndị na-agbanwe agbanwe, wdg. Otú ọ dị, na mgbakwunye na ọrụ ndị a, a pụkwara iji sulfur hexafluoride mee ihe dị ka ihe na-emepụta ihe eletrik. . Igwe eletrọnịkị sọlfọ hexafluoride dị ọcha bụ ezigbo elektrọnik, nke a na-ejikarị na teknụzụ microelectronics. Taa, onye nchịkọta akụkọ gas pụrụ iche Niu Ruide Yueyue ga-ewebata ngwa nke sulfur hexafluoride na silicon nitride etching na mmetụta nke paramita dị iche iche.

Anyị na-atụle usoro SF6 plasma etching SiNx, gụnyere ịgbanwe ike plasma, oke gas nke SF6 / He na ịgbakwunye cationic gas O2, na-atụle mmetụta ya na ọnụego etching nke SiNx element nchedo oyi akwa nke TFT, na iji plasma radieshon. spectrometer na-enyocha mgbanwe ntinye uche nke ụdị ọ bụla na SF6 / He, SF6 / He / O2 plasma na SF6 dissociation rate, ma nyochaa mmekọrịta dị n'etiti mgbanwe nke SiNx etching rate na plasma ụdị ntinye uche.

Nnyocha achọpụtala na mgbe ike plasma na-abawanye, ọnụ ọgụgụ etching na-abawanye; Ọ bụrụ na ọnụọgụ nke SF6 na plasma na-abawanye, F atom ntinye uche na-abawanye ma na-ejikọta ya na ọnụ ọgụgụ etching. Tụkwasị na nke ahụ, mgbe ị gbakwunyere gas cationic O2 n'okpuru ọnụ ọgụgụ zuru ezu na-edozi ahụ, ọ ga-enwe mmetụta nke ịba ụba nke etching, ma n'okpuru usoro dị iche iche nke O2 / SF6, a ga-enwe usoro mmeghachi omume dị iche iche, nke nwere ike kewaa n'ime akụkụ atọ. : (1) O2 / SF6 na-asọ asọ dị ntakịrị, O2 nwere ike inyere aka nkesa nke SF6, na ọnụ ọgụgụ etching n'oge a dị ukwuu karịa mgbe agbakwunyere O2. (2) Mgbe ọnụọgụ nke O2 / SF6 dị elu karịa 0.2 na etiti oge na-eru nso 1, n'oge a, n'ihi nnukwu ego nke dissociation nke SF6 iji mepụta F atoms, ọnụ ọgụgụ etching bụ nke kachasị elu; ma n'otu oge ahụ, O atoms na plasma na-abawanye na Ọ dị mfe ịmepụta SiOx ma ọ bụ SiNxO (yx) na SiNx film elu, na ka O atom na-abawanye, otú ahụ ka atom F ga-esikwu ike maka mmeghachi omume etching. Ya mere, ọnụ ọgụgụ etching na-amalite ịdalata mgbe oke O2/SF6 dị nso na 1. (3) Mgbe oke O2/SF6 karịrị 1, ọnụ ọgụgụ etching na-ebelata. N'ihi mmụba dị ukwuu na O2, atom F ndị kewara ekewa na-adaba na O2 na ụdị OF, nke na-ebelata mkpokọta F atom, na-ebute mbelata na ọnụego etching. Enwere ike ịhụ site na nke a na mgbe agbakwunyere O2, ọnụọgụ nke O2 / SF6 dị n'etiti 0.2 na 0.8, enwere ike nweta ọnụego etching kacha mma.