Ọrụ Sulfur Hexafluoride na silicon nitride etching

Sulfur Hexafluioride bụ gas nwere ezigbo ihe na-emegharị ma na-ejikarị igwe na-emegharị emegharị, na mgbakwunye na ọrụ ndị a. Nlele elektrọniki dị elu sulfur hexafluoride bụ ezigbo elektrọnik dị mma, nke a na-eji n'ọtụtụ teknụzụ microlelecric. Taa, Niu Rome Chereice pụrụ iche nke New Recomin Yuedue ga-ewebata ngwa nke sọlfọ na silicon nitchluide na silicon nitcher na mmetụta nke paramita dị iche iche.

Anyị kwurịtara sf6 plasma etchma etchm usoro, gụnyere ịgbanwe mmetụta nke ihe nkiri, na-eji plasma na-agbanwe agbanwe na SF6 / Ya, SF6 / Ya / O2 plasma na SF6 PASTA Ọnụego, ma na-enyocha mmekọrịta dị n'etiti mgbanwe nke nmehie nke Sinx Etching ọnụego na itinye uche nke plasma.

Nnyocha e mere achọpụtala na mgbe a na-abawanye ike plasma, ọnụego etching na-abawanye; Ọ bụrụ na ọnụego SF6 na Plasma na-amụba, ịta ụfụfụ na-abawanye ma na-eme ya na etche. Na mgbakwunye, mgbe ị na-agbakwunye gas gas o2 n'okpuru ọnụego ngụkọta nke SF6 / SF6 dị iche iche n'oge a ka ọ dị ukwuu karịa mgbe O2. (2) Mgbe ogo o2 / sf6 dị ukwuu karịa 0.2 ruo n'oge a, n'ihi nnukwu ego nke sf6 iji mepụta fim atọ ka nke kachasị elu; Ma n'otu oge ahụ, o atoms na plasma na-abawanye ma ọ dị mfe ịmepụta diox ma ọ bụ memmes na-abawanye, na ndị ọzọ na-abawanye, ndị ọzọ na-esikwu ike na-esiri ike na-eme ihe. Ya mere, ọnụ ọgụgụ na-amalite nwayọ mgbe ogo O2 / SF6 dị nso na 1. (3) Mgbe ruru o2 / SF6 ruru ka 1, ọnụego na-ebelata. N'ihi nnukwu mmụba na o2, famms flues na-achasi ike na o2 na ụdị, nke na-ebelata ịta nke atọ, na-ebute mbelata nke etche. Enwere ike ịhụ ya site na nke a mgbe etinyere ya O2, ọkwa nke O2 / SF6 dị n'agbata 0.2 na 0.8, na ọnụego kacha mma etching kachasị mma.