Ọrụ nke sọlfọ hexafluoride na silicon nitride etching

Sulfur hexafluoride bụ gas nke nwere ihe mkpuchi dị mma ma na-ejikarị emenyụ ọkụ eletrik dị elu na-ekpochapụ na ndị na-agbanwe agbanwe, eriri nnyefe voltaji, ndị na-agbanwe agbanwe, wdg. Otú ọ dị, na mgbakwunye na ọrụ ndị a, a pụkwara iji sulfur hexafluoride mee ihe dị ka ihe ntanetị eletrik. Igwe eletrọnịkị sọlfọ hexafluoride dị ọcha bụ ezigbo elektrọnik, nke a na-ejikarị na teknụzụ microelectronics. Taa, onye nchịkọta akụkọ gas pụrụ iche Niu Ruide Yueyue ga-ewebata ngwa nke sulfur hexafluoride na silicon nitride etching na mmetụta nke paramita dị iche iche.

Anyị na-atụle usoro SF6 plasma etching SiNx, gụnyere ịgbanwe ike plasma, oke gas nke SF6 / Ọ na-agbakwụnye cationic gas O2, na-atụle mmetụta ya na ọnụ ọgụgụ etching nke SiNx element nchedo oyi akwa nke TFT, na iji plasma radieshon The spectrometer na-enyocha mgbanwe ntinye uche nke ụdị ọ bụla na SF6 / He, SF6 / He / O2 plasma na-enyocha mgbanwe mgbanwe n'etiti SF6 na mgbanwe mgbanwe n'etiti SFXN na mgbanwe mgbanwe n'etiti SFx. Ọnụ ọgụgụ etching na ntinye nke ụdị plasma.

Nnyocha achọpụtala na mgbe ike plasma na-abawanye, ọnụ ọgụgụ etching na-abawanye; Ọ bụrụ na mmụba nke SF6 na plasma na-abawanye, F atom ntinye uche na-abawanye ma na-ejikọta ya na ọnụ ọgụgụ etching. Tụkwasị na nke ahụ, mgbe ị gbakwunyere gas cationic O2 n'okpuru ọnụ ọgụgụ zuru ezu nke edozi, ọ ga-enwe mmetụta nke ịba ụba etching ọnụego, ma n'okpuru dị iche iche O2 / SF6 eruba eruba, a ga-enwe dị iche iche mmeghachi omume usoro, nke nwere ike kewara n'ime atọ akụkụ: (1) O2 / SF6 eruba eruba dị nnọọ obere, O2 nwere ike inyere dissociation nke SF6, na etching ọnụego n'oge a na-adịghị agbakwunyere O2. (2) Mgbe ọnụọgụ nke O2 / SF6 dị elu karịa 0.2 na etiti oge na-eru nso 1, n'oge a, n'ihi nnukwu ego nke dissociation nke SF6 iji mepụta F atoms, ọnụ ọgụgụ etching bụ nke kachasị elu; ma n'otu oge ahụ, O atoms na plasma na-abawanye na Ọ dị mfe ịmepụta SiOx ma ọ bụ SiNxO (yx) na elu ihe nkiri SiNx, na ka O atom na-abawanye, ka F atoms ga-esikwu ike maka mmeghachi omume etching. Ya mere, ọnụ ọgụgụ etching na-amalite ịdalata mgbe oke O2/SF6 dị nso na 1. (3) Mgbe oke O2/SF6 karịrị 1, ọnụ ọgụgụ etching na-ebelata. N'ihi mmụba dị ukwuu na O2, atom F ndị kewara ekewa na-adaba na O2 na ụdị OF, nke na-ebelata mkpokọta F atom, na-ebute mbelata na ọnụego etching. Enwere ike ịhụ site na nke a na mgbe agbakwunyere O2, ọnụọgụ nke O2 / SF6 dị n'etiti 0.2 na 0.8, enwere ike nweta ọnụego etching kacha mma.