Gas pụrụ iche nke eletrọnịkị kacha eji - nitrogen trifluoride

Gasị eletrọnịkị pụrụ iche nwere fluorine a na-ahụkarị gụnyeresọlfọ hexafluoride (SF6)tungsten hexafluoride (WF6),carbon tetrafluoride (CF4), trifluoromethane (CHF3), nitrogen trifluoride (NF3), hexafluoroethane (C2F6) na octafluoropropane (C3F8).

Site na mmepe nke nanotechnology na nnukwu mmepe nke ụlọ ọrụ eletrọnịkị, ọchịchọ ya ga-abawanye kwa ụbọchị. Nitrogen trifluoride, dị ka ihe dị mkpa na nnukwu-eji eletrọnịkị pụrụ iche gas na mmepụta na nhazi nke ogwe na semiconductor, nwere sara mbara ahịa ohere.

Dị ka ụdị gas pụrụ iche nwere fluorine.nitrogen trifluoride (NF3)bụ ngwaahịa gas pụrụ iche nke eletrọnịkị nwere ikike ahịa kachasị ukwuu. Ọ bụ kemịkalụ inert na ụlọ okpomọkụ, na-arụ ọrụ karịa oxygen na okpomọkụ dị elu, kwụsie ike karịa fluorine, ma dị mfe ijikwa. A na-ejikarị Nitrogen trifluoride eme ihe dị ka plasma etching gas na onye na-eme ihe na-ehicha ụlọ, ọ dịkwa mma maka mpaghara mmepụta nke semiconductor chips, panel panel panel, fiber optical, photovoltaic cell, wdg.

E jiri ya tụnyere gas eletrọnịkị nwere fluorine ndị ọzọ.nitrogen trifluoridenwere uru nke mmeghachi omume ngwa ngwa na arụmọrụ dị elu. Karịsịa na etching nke ihe ndị nwere silicon dị ka silicon nitride, ọ nwere ọnụ ọgụgụ dị elu na nhọrọ nhọrọ, na-ahapụghị ihe fọdụrụ n'elu ihe etched. Ọ bụkwa ezigbo ihe na-ehicha ihe na enweghị mmetọ n'elu, nke nwere ike izute mkpa nke usoro nhazi.