Ụlọ ọrụ semiconductor nke mba anyị na ụlọ ọrụ panel na-ejigide ọganihu dị elu. Nitrogen trifluoride, dị ka gas eletrọnịkị pụrụ iche nke dị mkpa na nke kachasị ukwuu na mmepụta na nhazi nke ogwe na semiconductor, nwere ohere ahịa sara mbara.
Gasị eletrọnịkị pụrụ iche nke nwere fluorine a na-ejikarị gụnyeresọlfọ hexafluoride (SF6)tungsten hexafluoride (WF6),carbon tetrafluoride (CF4), trifluoromethane (CHF3), nitrogen trifluoride (NF3), hexafluoroethane (C2F6) na octafluoropropane (C3F8). Nitrogen trifluoride (NF3) na-ejikarị dị ka isi iyi fluorine maka hydrogen fluoride-fluoride gas lasers kemịkalụ ike dị elu. Akụkụ dị irè (ihe dị ka 25%) nke ume mmeghachi omume dị n'etiti H2-O2 na F2 nwere ike ịhapụ ya site na radieshon laser, ya mere HF-OF lasers bụ lasers kachasị mma n'etiti lasers kemịkalụ.
Nitrogen trifluoride bụ ezigbo gas etching plasma na ụlọ ọrụ microelectronics. Maka etching silicon na silicon nitride, nitrogen trifluoride nwere ọnụ ọgụgụ etching dị elu na nhọrọ karịa carbon tetrafluoride na ngwakọta nke carbon tetrafluoride na oxygen, ọ nweghịkwa mmetọ n'elu. Karịsịa na etching nke ihe sekit agbakwunyere na ọkpụrụkpụ nke na-erughị 1.5um, nitrogen trifluoride nwere ọnụ ọgụgụ dị oke mma nke etching na selectivity, na-ahapụghị ihe fọdụrụ n'elu ihe etched, ma bụrụkwa ezigbo onye na-ehicha ihe. Site na mmepe nke nanotechnology na nnukwu mmepe nke ụlọ ọrụ eletrọnịkị, ọchịchọ ya ga-abawanye kwa ụbọchị.
Dị ka ụdị gas pụrụ iche nwere fluorine, nitrogen trifluoride (NF3) bụ ngwaahịa gas pụrụ iche nke eletrọnịkị kachasị na ahịa. Ọ bụ kemịkalụ inert na ụlọ okpomọkụ, na-arụ ọrụ karịa oxygen, kwụsie ike karịa fluorine, ma dị mfe ijikwa na okpomọkụ dị elu.
A na-eji Nitrogen trifluoride eme ihe dị ka plasma etching gas na onye na-ahụ maka ime ụlọ mmeghachi omume na-ehicha ihe, dabara maka mpaghara nrụpụta dị ka ibe semiconductor, ihe ngosi panel panel, eriri anya, sel fotovoltaic, wdg.
E jiri ya tụnyere gas eletrik ndị ọzọ nwere fluorine, nitrogen trifluoride nwere uru nke mmeghachi omume ngwa ngwa na arụmọrụ dị elu, karịsịa na etching nke ihe ndị nwere silicon dị ka silicon nitride, ọ nwere ọnụ ọgụgụ dị elu na selectivity, na-ahapụ ọ dịghị ihe fọdụrụ n'elu nke etched ihe, na ọ bụkwa nnọọ ezigbo mma, na ọ bụ ndị na-abụghị ndị na-emetọ usoro na-egbo mkpa ihicha ụlọ ọrụ.
Oge nzipu: Dec-26-2024