Laser gas

A na-ejikarị gas laser eme ihe maka ịbelata laser na gas lithography na ụlọ ọrụ eletrọnịkị. Na-erite uru site na mmepụta nke ihuenyo ekwentị mkpanaaka na mgbasawanye nke mpaghara ngwa, ọnụ ọgụgụ nke ahịa polysilicon na-ekpo ọkụ ga-abawanyewanye, na usoro nkwụsịtụ laser emeela ka arụmọrụ nke TFT dịkwuo mma. N'ime gas neon, fluorine, na argon nke ejiri na ArF excimer laser maka imepụta semiconductor, neon nwere ihe karịrị 96% nke ngwakọta gas laser. Site na nchacha nke teknụzụ semiconductor, ojiji nke eximer lasers abawanyela, na iwebata teknụzụ ikpughe okpukpu abụọ emeela ka mmụba dị ukwuu na-achọ gas neon gas nke ArF excimer lasers na-eri. Na-erite uru site n'ịkwalite mpaghara nke gas pụrụ iche nke eletrọnịkị, ndị na-emepụta ụlọ ga-enwe ohere ọganihu ahịa ka mma n'ọdịnihu.

Igwe lithography bụ akụrụngwa bụ isi nke nrụpụta semiconductor. Lithography na-akọwa nha transistors. Mmepe a na-ahazi nke agbụ ụlọ ọrụ lithography bụ isi ihe na-eme ka ọ pụta ìhè nke igwe lithography. Ihe semiconductor dabara adaba dị ka fotoresist, gas photolithography, fotomask, na mkpuchi na akụrụngwa na-emepe emepe nwere ọdịnaya teknụzụ dị elu. Lithography gas bụ gas nke igwe lithography na-emepụta laser ultraviolet miri emi. Igwe ọkụ lithography dị iche iche nwere ike imepụta isi mmalite ọkụ dị iche iche, ogologo ebili mmiri ha na-emetụtakwa mkpebi nke igwe lithography, nke bụ otu n'ime isi nke igwe lithography. N'afọ 2020, ngụkọta ahịa igwe lithography zuru ụwa ọnụ ga-abụ nkeji 413, nke ASML ahịa 258 bụ 62%, ire ahịa Canon 122 bụ 30%, na Nikon ahịa 33 nkeji ruru 8%.