Gas laser

A na-ejikarị gas laser eme ihe maka laser annealing na lithography gas n'ụlọ ọrụ eletrọniki. Site na ihe ọhụrụ nke ihuenyo ekwentị mkpanaaka na mmụba nke ebe eji eme ihe, a ga-agbasakwu ahịa polysilicon dị ala, usoro laser annealing emeela ka arụmọrụ nke TFT ka mma nke ukwuu. N'ime gas neon, fluorine, na argon ejiri na laser ArF excimer maka imepụta semiconductors, neon na-akpata ihe karịrị 96% nke ngwakọta gas laser. Site na mmezi nke teknụzụ semiconductors, ojiji nke laser excimer amụbaala, na ntinye nke teknụzụ ikpughe okpukpu abụọ emeela ka ọchịchọ maka gas neon nke lasers excimer ArF na-eri dịkwuo elu. Site n'ịkwalite ebe gas pụrụ iche eletrọniki dị, ndị na-emepụta ihe n'ụlọ ga-enwe ohere uto ahịa ka mma n'ọdịnihu.

Igwe lithography bụ isi ihe eji emepụta semiconductor. Lithography na-akọwa nha transistors. Mmepe nhazi nke usoro ụlọ ọrụ lithography bụ isi ihe na-eme ka igwe lithography pụta ìhè. Ihe ndị semiconductor dakọtara dịka photoresist, gas photolithography, photomask, na mkpuchi na akụrụngwa na-emepe emepe nwere ọdịnaya teknụzụ dị elu. Gas lithography bụ gas nke igwe lithography na-emepụta laser ultraviolet miri emi. Gas lithography dị iche iche nwere ike ịmepụta isi iyi ìhè nke ogologo ebili dị iche iche, ogologo ebili ha na-emetụtakwa mkpebi nke igwe lithography ozugbo, nke bụ otu n'ime isi igwe lithography. Na 2020, mkpokọta ahịa zuru ụwa ọnụ nke igwe lithography ga-abụ nkeji 413, nke ASML 258 nkeji rere ruru 62%, Canon 122 nkeji rere ruru 30%, na Nikon 33 nkeji rere ruru 8%.