Ọpụrụiche gasdị iche na izugbegas mmepụta ihena ha nwere pụrụ iche ojiji na-etinyere na kpọmkwem ubi. Ha nwere ihe a kapịrị ọnụ maka ịdị ọcha, ọdịnaya adịghị ọcha, ihe mejupụtara, yana ihe anụ ahụ na kemịkal. E jiri ya tụnyere gas ụlọ ọrụ mmepụta ihe, gas pụrụ iche dị iche iche n'ụdị dị iche iche mana ha nwere obere mmepụta na ọnụ ahịa ahịa.

Nkengwakọta gasnagas calibration ọkọlọtọanyị na-ejikarị bụ akụkụ dị mkpa nke gas pụrụ iche. A na-ekekarị ikuku agwakọtara gaa na gas agwakọtara ọnụ na ikuku agwakọta elektrọn.

Ngwakọta gas niile gụnyere:laser agwakọta gas, Nchọpụta ngwa agwakọta gas, ịgbado ọkụ agwakọta gas, ichekwa agwakọtara gas, ọkụ eletrik agwakọta gas, ọgwụ na usoro ndụ nnyocha agwakọtara gas, disinfection na sterilization agwakọta gas, ngwá mkpu agwakọta gas, elu-nrụgide agwakọta gas, na efu-ọkwa ikuku.

Ngwakọta gas eletrọnịkị gụnyere ngwakọta gas epitaxial, ngwakọta gas na-etinye mmiri kemịkalụ, ngwakọta gas doping, ngwakọta gas etching na ngwakọta gas eletrọnịkị ndị ọzọ. Ngwakọta gas ndị a na-arụ ọrụ dị mkpa na ụlọ ọrụ semiconductor na microelectronics ma na-ejikarị ya na nnukwu sekit agbakwunyere (LSI) na mmepụta sekit agbakwunyere (VLSI), yana mmepụta ngwaọrụ semiconductor.

5 Ụdị gas gwakọtara ọnụ bụ nke a na-ejikarị eme ihe

Doping agwakọta gas

N'imepụta ngwaọrụ semiconductor na sekit jikọtara ọnụ, a na-ewebata ụfọdụ adịghị ọcha n'ime ihe ndị na-eme ihe na-emepụta ihe na-eme ka ọ bụrụ ihe na-eme ka ọ bụrụ ihe na-eme ka ọ bụrụ ihe na-eme ka ọ bụrụ ihe na-adịghị mma, na-eme ka mmepụta nke resistors, PN junctions, lie layers, na ihe ndị ọzọ. A na-akpọ gas ndị a na-eji eme ihe n'ime usoro doping. Igwe ikuku ndị a gụnyere arsine, phosphine, phosphorus trifluoride, phosphorus pentafluoride, arsenic trifluoride, arsenic pentafluoride,boron trifluoride, na diborane. A na-agwakọtakarị isi iyi dopant na gas na-ebu ibu (dị ka argon na nitrogen) na kọbọd isi iyi. A na-agbanye gas agwakọtara ọnụ n'ihu n'ime ọkụ na-ekesa ma na-ekesa gburugburu wafer, na-edobe dopant n'elu wafer. Dopant ahụ na-emeghachi omume na silicon ka ọ bụrụ metal dopant nke na-akwaga na silicon.

Ngwakọta gas nke uto Epitaxial

Uto epitaxial bụ usoro idobe na itolite otu ihe kristal n'elu ala. N'ime ụlọ ọrụ semiconductor, gas ndị a na-eji na-eto otu ma ọ bụ karịa n'ígwé site na iji kemịkalụ vapor deposition (CVD) na mkpụrụ nke ahọpụtara nke ọma ka a na-akpọ gases epitaxial. Gases epitaxial silicon na-agụnye dihydrogen dichlorosilane, silicon tetrachloride, na silane. A na-eji ha eme ihe maka ntinye silicon epitaxial, ntinye silicon polycrystalline, ntinye ihe nkiri silicon oxide, ntinye ihe nkiri silicon nitride, na ntinye ihe nkiri silicon amorphous maka mkpụrụ ndụ anyanwụ na ngwaọrụ ndị ọzọ na-ahụ foto.

Ion ntinye gas

Na ngwaọrụ semiconductor na n'ichepụta sekit agbakwunyere, a na-akpọkarị gas ndị a na-eji na ion ion dị ka gas implantation gas. A na-eme ka adịghị ọcha nke ionized (dị ka boron, phosphorus, na ion arsenic) na-aga n'ihu ruo ọkwa ume dị elu tupu etinye ya n'ime mkpụrụ. A na-ejikarị teknụzụ ntinye ion iji chịkwaa voltaji ọnụ ala. Enwere ike ikpebi ọnụọgụ adịghị arụrụ arụ site na ịlele ion beam current. Ion gas etinyere na-agụnyekarị phosphorus, arsenic, na gas boron.

Etching agwakọta gas

Etching bụ usoro ịwepụ elu ahụ edoziri (dị ka ihe nkiri ígwè, ihe nkiri silicon oxide, wdg) na mkpụrụ nke na-adịghị ekpuchi fotoresisist, ebe a na-echekwa ebe ahụ site na photoresisist, iji nweta ụkpụrụ onyonyo achọrọ n'elu ala.

Ngwakọta ikuku nke kemịkalụ ikuku

Kemịkalụ vapor deposition (CVD) na-eji ogige na-agbanwe agbanwe iji tinye otu ihe ma ọ bụ ngwakọta site na mmeghachi omume kemịkalụ vapo-phase. Nke a bụ usoro mmepụta ihe nkiri nke na-eji mmeghachi omume kemịkalụ vapo-phase. Igwe ọkụ CVD ejiri mee ihe dịgasị iche dabere n'ụdị ihe nkiri a na-emepụta.