Carbon tetrafluoride (CF4)

Nkọwa dị mkpirikpi:

Carbon tetrafluoride, nke a makwaara dị ka tetrafluoromethane, bụ gas na-enweghị ụcha na ọnọdụ okpomọkụ na nrụgide nkịtị, nke na-adịghị edozi na mmiri. gas CF4 bụ ugbu a bụ gas etching plasma kachasị eji na ụlọ ọrụ microelectronics. A na-ejikwa ya dị ka gas laser, refrigerant cryogenic, ihe mgbaze, mmanu, ihe mkpuchi, na coolant maka tubes nchọpụta infrared.


Nkọwa ngwaahịa

Mkpado ngwaahịa

Nka nka

Nkọwapụta 99.999%
Oxygen + argon ≤1pm
Nitrogen ≤4 ppm
Mmiri (H2O) ≤3 ppm
HF ≤0.1 ppm
CO ≤0.1 ppm
CO2 ≤1 ppm
SF6 ≤1 ppm
Halocarbynes ≤1 ppm
Mgbakọta adịghị ọcha ≤10 ppm

Carbon tetrafluoride bụ hydrocarbon halogenated nwere usoro kemịkalụ CF4. Enwere ike were ya dị ka hydrocarbon halogenated, methane halogenated, perfluorocarbon, ma ọ bụ dị ka ogige inorganic. Carbon tetrafluoride bụ gas na-enweghị isi na enweghị isi, nke na-esighi ike na mmiri, soluble na benzene na chloroform. Kwụsie ike n'okpuru ọnọdụ okpomọkụ na nrụgide nkịtị, zere oxidants siri ike, ihe ọkụ ọkụ ma ọ bụ ọkụ. Gas na-enweghị ọkụ, nrụgide dị n'ime nke akpa ahụ ga-abawanye mgbe ọ na-ekpo ọkụ dị elu, enwerekwa ihe ize ndụ nke mgbawa na mgbawa. Ọ bụ kemịkalụ kwụsiri ike na ọ naghị ere ọkụ. Naanị mmiri mmiri amonia-sodium metal reagent nwere ike ịrụ ọrụ na ụlọ okpomọkụ. Carbon tetrafluoride bụ gas na-akpata mmetụta griin haus. Ọ kwụsiri ike nke ukwuu, nwere ike ịnọ n'ikuku ruo ogologo oge, yana gas na-ekpo ọkụ nke ukwuu. A na-eji carbon tetrafluoride mee ihe na usoro etching plasma nke sekit agbakwunyere dị iche iche. A na-ejikwa ya dị ka gas laser, a na-ejikwa ya na refrigerants dị ala, ihe mgbaze, mmanụ mmanu, ihe mkpuchi, na coolants maka nchọpụta infrared. Ọ bụ plasma etching gas kacha eji na ụlọ ọrụ microelectronics. Ọ bụ ngwakọta nke tetrafluoromethane gas dị ọcha na tetrafluoromethane gas dị ọcha na ikuku oxygen dị elu. Enwere ike iji ya na silicon, silicon dioxide, silicon nitride, na iko phosphosilicate. A na-ejikwa etching nke ihe nkiri dị gịrịgịrị dị ka tungsten na tungsten n'ọtụtụ ebe na ihicha elu nke ngwaọrụ eletrọnịkị, mmepụta cell cell, teknụzụ laser, refrigeration dị ala, nleba anya, na ncha na mmepụta sekit ebipụtara. Ejiri ya dị ka igwe na-ekpo ọkụ na-ekpo ọkụ yana teknụzụ etching akọrọ plasma maka sekit agbakwunyere. Akpachara anya maka nchekwa: Chekwaa n'ụlọ nkwakọba ihe ikuku na-ekpo ọkụ na-adịghị ọkụ. Wepụ ọkụ na isi mmalite okpomọkụ. Okpomọkụ nchekwa ekwesịghị gafere 30 Celsius. Ekwesịrị ịchekwa ya iche site na ngwa ngwa (ọkụ) combusible na oxidants, ma zere nchekwa agwakọta. Ebe nchekwa ahụ kwesịrị ịnwe akụrụngwa ọgwụgwọ ihe mberede na-agbapụta.

Ngwa:

① friji:

A na-eji Tetrafluoromethane mgbe ụfọdụ dị ka ihe nju oyi dị ala.

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② na-akpụ akpụ:

A na-eji ya na microfabrication nke eletrọnịkị naanị ma ọ bụ jikọtara ya na oxygen dị ka ihe na-emepụta plasma maka silicon, silicon dioxide, na silicon nitride.

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Ngwungwu nkịtị:

Ngwaahịa Carbon tetrafluorideCF4
Nha ngwugwu 40 lita cylinder 50 lita cylinder  
Na-ejuputa Net arọ/Cyl 30kgs 38kgs  
Ebuuru QTY n'ime akpa 20' 250 Cyl 250 Cyl
Mkpokọta ibu Netwọk 7.5 Tọn 9.5 Tọn
Cylinder Tare Ibu 50kgs 55kgs
Valve CGA 580

Uru:

① Ịdị ọcha dị elu, ụlọ ọrụ kachasị ọhụrụ;

② onye nrụpụta akwụkwọ ISO;

③Nfefe ngwa ngwa;

④ Usoro nyocha nke ntanetị maka njikwa mma na usoro ọ bụla;

⑤ High chọrọ na usoro nlezianya maka ijikwa cylinder tupu ejuputa;


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